Error-free reticles are the first step in achieving high yields, since
reticle defects can be replicated on production wafers. Both mask shops and IC
fabs rely on high sensitivity reticle inspection and metrology systems to ensure
that reticles are defect-free and meet mask metrology requirements.
Defect Inspection
TeraScan: Photomask inspection systems to enable production of advanced-node
reticles at mask shops including Wafer Plane InspectionTM (WPI) capabilities
TeraFab: Photomask inspection systems allowing IC fabs to qualify incoming
reticles and inspect production reticles for contaminants
TeraStar: Photomask inspection system enabling mask shop production of reticles
for larger design-rule devices
CD and Overlay Metrology
LWM 9045: SEM-based Critical Dimension (CD) measurement system for reticles
LMS IPRO4: Fully automated system capable of measuring reticle pattern
placements
Data Management and Analysis
9Xi: Central data hub serving KLA-Tencor reticle inspection equipment
Company Details
Corporate History
KLA-Tencor was formed in May 1997 through the merger of KLA Instruments and
Tencor Instruments, two long-time leaders in the semiconductor equipment
industry, each with over 20 years of experience. With combined... more
