Versatile UHV evaporators with integral flux monitor for high purity thin film growth and MBE. Applicable for a wide range of evaporants due to 160 to 3300 degrees Celsius temperature range. The temperature range of the EFM 4 is the same as of the EFM 3, but the EFM 4 offers a larger deposition area of 10 mm to 50 mm.The EVC 300 and EVC 100 control electronics are fully microprocessor controlled, and allow the adjustment of all evaporation parameters within a user friendly menue structure. Both supplies feature the storage of 10 complete sets of evaporation parameters, as well as the graphical display of the evaporant flux. In addition, the EVC 300 allows the full remote control via an RS232 interface from a PC, and includes a flux regulation for automated, reliable, stabilisation of the deposition rate
