• Minimum spot size: < 2 µm at > 5nA and 5kV
• Beam energy: 100 eV - 5 keV
• Maximum beam current: >10 µA
• Filament type: LaB6
• Flange to sample distance: 285 mm
The small-spot electron source EKF 1000 provides a compact and cost-effective solution for a wide range of SAM and SEM applications as well as static AES. It offers a highly stabilised beam current, and an achievable spot size < 2 µm at 5 keV with > 5 nA beam current. The source is equipped with a LaB6 filament enabling a high maximum beam current >10 µA. Quadrupole x/y-deflectors are employed for static and dynamic beam deflection in SAM and SEM imaging. The NGE 52 control unit covers the energy range from 100 eV to 5 keV and delivers a highly stabilised emission-regulated filament supply for reliable quantitative Auger analysis. The separate scan control unit (SCU) supports both internal TV rate and PC controlled scanning.
Company Details
1984
Omicron starts it's business with the presentation of the revolutionary reverse view LEED principle.
1987
Omicron develops the legendary STM 1, the companies first Scanning Tunneling Microscope
1989
Foundation of an Omicron subsidiary... more
